Jaione Tirapu-Azpiroz
Jaione Tirapu-Azpiroz
IBM Research
Verifisert e-postadresse på br.ibm.com - Startside
Sitert av
Sitert av
Boundary layer model to account for thick mask effects in photolithography
J Tirapu-Azpiroz, P Burchard, E Yablonovitch
Optical Microlithography XVI 5040, 1611-1619, 2003
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
K Lai, AE Rosenbluth, S Bagheri, J Hoffnagle, K Tian, D Melville, ...
Optical Microlithography XXII 7274, 82-93, 2009
Intensive optimization of masks and sources for 22nm lithography
AE Rosenbluth, DO Melville, K Tian, S Bagheri, J Tirapu-Azpiroz, K Lai, ...
Optical Microlithography XXII 7274, 67-81, 2009
Benefits and trade-offs of global source optimization in optical lithography
K Tian, A Krasnoperova, D Melville, AE Rosenbluth, D Gil, ...
Optical Microlithography XXII 7274, 105-116, 2009
Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations
JT Azpiroz, AE Rosenbluth, I Graur
US Patent 8,078,995, 2011
Process optimization through model based SRAF printing prediction
R Viswanathan, JT Azpiroz, P Selvam
Optical Microlithography XXV 8326, 437-446, 2012
Graphene-enabled and directed nanomaterial placement from solution for large-scale device integration
M Engel, DB Farmer, JT Azpiroz, JWT Seo, J Kang, P Avouris, ...
Nature communications 9 (1), 4095, 2018
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
D Melville, AE Rosenbluth, K Tian, K Lai, S Bagheri, J Tirapu-Azpiroz, ...
Optical Microlithography XXIII 7640, 51-68, 2010
Massively-parallel FDTD simulations to address mask electromagnetic effects in hyper–NA immersion lithography
JT Azpiroz, GW Burr, AE Rosenbluth, M Hibbs
Optical Microlithography XXI 6924, 336-350, 2008
Modeling polarization for hyper-NA lithography tools and masks
K Lai, AE Rosenbluth, G Han, J Tirapu-Azpiroz, J Meiring, ...
Optical Microlithography XX 6520, 152-173, 2007
Fast evaluation of photomask near-fields in subwavelength 193-nm lithography
J Tirapu-Azpiroz, E Yablonovitch
Optical Microlithography XVII 5377, 1528-1535, 2004
Study of the delay characteristics of 1‐D photonic bandgap microstrip structures
J Tirapu, T Lopetegi, MAG Laso, MJ Erro, F Falcone, M Sorolla
Microwave and Optical Technology Letters 23 (6), 346-349, 1999
system and method for projection lithography with immersed image-aligned diffractive element
D Gil, DO Melville, AE Rosenbluth, K Tian, JT Azpiroz
US Patent App. 12/168,310, 2010
Method for optimizing source and mask to control line width roughness and image log slope
K Tian, AE Rosenbluth, DO Melville, JT Azpiroz, S Bagheri, K Lai
US Patent 8,372,565, 2013
Incorporating mask topography edge diffraction in photolithography simulations
J Tirapu-Azpiroz, E Yablonovitch
JOSA A 23 (4), 821-828, 2006
Improving yield through the application of process window OPC
JT Azpiroz, A Krasnoperova, S Siddiqui, K Settlemyer, I Graur, I Stobert, ...
Optical Microlithography XXII 7274, 346-358, 2009
Method for forming arbitrary lithographic wavefronts using standard mask technology
AE Rosenbluth, J Tirapu-Azpiroz
US Patent 8,108,802, 2012
Analysis and modeling of photomask near-fields in sub-wavelength deep ultraviolet lithography with optical proximity corrections
J Tirapu-Azpiroz
Ph. D. Dissertation, University of California, Los Angeles, 2004
Computational lithography: exhausting the resolution limits of 193-nm projection lithography systems
DOS Melville, AE Rosenbluth, A Waechter, M Millstone, J Tirapu-Azpiroz, ...
Journal of Vacuum Science & Technology B 29 (6), 2011
Devices for trapping and controlling microparticles with radiation
JT Azpiroz
US Patent 9,739,751, 2017
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